ResearchClean Room Facility
For the fabrication of nanostructures and quantum circuits including superconducting, spintronic and nanomechanical devices, the WMI operates a class-1000 clean room facility. The clean room is subdivided into two parts for optical lithography and electron beam lithography, respectively.
Team
The clean room is equipped with the standard tools for photolithography such as resist coaters, hot plates, wet benches, a Karl Süss MJB3 mask aligner, and the direct laser writing system PicoMaster 200. It further hosts a reactive ion etching system with ICP plasma source.
Finally, the 100 kV e-beam lithography system nB5 is installed in the second part of the clean room facility. The nB5 is a round-beam step-and-repeat system oriented towards high-end R&D applications at universities and research institutes for nanopatterning and mixed-match lithography.